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W,Mo,Ta,Nb
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  Targets >> Alloy Sputtering Targets >> Tantalum Tungsten(Taw) Alloy Sputtering Target
 

Specifications:
  

Purity --- >99.99%, 99.995% 90/10 wt%, 80/20wt%, or custom-made
Shape --- Discs, Rectangle, Step, Plates, Sheets, Rods, Custom-Made
Dimension --- Diameter (≤300mm), Length (≤500mm), Width (≤300mm), Thickness (≥1mm), Custom-Made

Application:Coating for Semiconductor, be used as diffusion barrier for advanced packaging, e.g. Flip-Chip technology, and in a variety of compounds.

Contact Telephone:0086-20-87751296


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